Metal etching process technology is divided into two kinds of wet etching and dry etching, metal etching process is composed of some series of chemical processes. Mainly through the reaction of chemical solution or physical impact on the metal material to dissolve the formation of the corresponding pattern.

Metal etching process is also known as photo-chemical etching, the main process is through the surface treatment of the metal material, the surface of the grease and non-normal surface polishing, etc., after the attached film for exposure machine exposure, and then through the development, through the cooling, through the etching stage, the use of chemical solution contact, remove the metal etching area of the protective film, in order to dissolve corrosion, the formation of bumps or gouge. Etching technology has been fully integrated into aviation, machinery, chemical, semiconductor manufacturing process, electronic information industry, etc.

The advantages of metal etching process are low cost of sample making, almost all metals are within the range of etching, no limitation on metal hardness, no scratches, no burrs, fast, simple and efficient design, 48 hours of process time, ±10% influence of material thickness on tolerance, extremely easy product packaging and transfer. High manufacturing cost on stamping, although all metals can be carried out, but in the hardness is too large, too small, easy to break the metal are not available, cut on the edge of the scratch, local burr.