High-precision strain gauge sensor etching service to produce foil strain gauge grids by photochemical etching. Tight tolerance, ultra-fine trace patterns for force, pressure, torque and weight measur

Custom photo etched parts manufactured by photochemical etching. Burr-free, stress-free thin metal components with tight tolerances, half-etch fold lines, fast prototyping, low MOQ for electronics, ae

Learn about the EMI shielding etching process for thin metal EMI shielding cans, frames and gaskets. Burr-free, tight tolerance photochemical etching for electronics, RF, communication and PCB shieldi

Custom photo etched brass model parts for ship, aircraft, military tank, vehicle scale models. Burr-free brass PE fret with half-etched fold lines, ultra-fine scale details, fast prototyping & low MOQ

Semiconductor lead frame wet etching service manufactures burr-free fine-pitch lead frames for IC packaging, offering tight micron tolerance and rapid prototyping.

Custom reel to reel etching stencil mask uses continuous roll photochemical etching for high-volume precision masks for semiconductor packaging & thin-film deposition.

Medical device etching delivers burr-free, stress-free precision metal parts for surgical, diagnostic & implant devices, meeting ISO 13485 micron-level tolerance requirements.

Photochemical etching makes burr-free, stress-free optical parts — aperture plates, slits, masks, gratings, with micron tolerance for spectrometers and lasers.

Power electronics etching uses wet chemical etching and dry plasma etching to manufacture high-reliability micro-components for energy conversion systems. It produces burr-free low-stress metal foils,

Electronics etching covers wet chemical etching and dry plasma etching, delivering high-precision micro structures for consumer, industrial and power electronics. It manufactures burr-free thin metal

Capacitively Coupled Plasma (CCP) etching is a high-precision dry subtractive manufacturing technology for aerospace components. It delivers anisotropic, high-aspect-ratio micro and nano structures on

Sputter etching is a vacuum-based physical dry etching process for EV battery components. Using inert gas ion bombardment, it achieves nanoscale controlled material removal and surface texturing on cu